Facilities
Select a facility's name or photo to learn more.
LSM XPS Facility
- Advanced surface, interface and thin film analysis and consultation services to academics and industry
- Training of students and technical staff in XPS and related surface analytical techniques
1.7 MV Tandetron Accelerator Facility
- Determination the structure and chemical composition of very thin films of technological materials (1-100 nm thick)
- It works by bombarding the thin films with energetic ions, and measuring the ions that scatter back to a detector (Rutherford Backscattering Spectroscopy)
- The different metal "pipes' in the foreground are beamlines used for different experiments
Medium-Energy Ion Scattering (MEIS)
- Determination of structural and compositional properties of surfaces and thin films
- Energy and angle resolved detection of backscattered ions provides surface structural and compositional information. The ions are created and accelerated in a 400 keV ion implanter produced by High Voltage Engineering (Amersfoort, The Netherlands)
Atomic Layer Deposition
- Allows layer by layer growth of ultra thin films (highly conformal deposition technique), based on self-terminating surface chemical reactions
- In-situ Infrared Absorption spectroscopy using FTIR available
- Ideal for mechanistic studies of growth of metal and metal oxide films
- Current substrates include silicon, germanium, gallium arsenide